What is Hafnium Disilicide HfSi2? Hafnium disilicide or hafnium silicide with the molecular formula HfSi2 has the molecular weight of 234.66. It is gray powder. Hafnium disilicide is a kind of transition metal silicide and a kind of refractory intermetallic compounds. Because of its unique physical and chemical properties, hafnium disilicide has been successfully used in the fields of complementary metal oxide semiconductor components, thin film coatings, bulk structural components, electrothermal elements, thermoelectric materials, and photovoltaic materials. Hafnium disilicide nanomaterials show special electrical, optical, magnetic and thermoelectric properties, and even have potential applications in the field of catalysis.
What is Hafnium Disilicide HfSi2 Used For? 1. To prepare silicon carbide-hafnium silicide-tantalum silicide (SiC-HfSi2-TaSi2) anti-ablation composite coating Carbon fiber reinforced carbon (Chand C) composite is a new type of high temperature resistant composite with carbon fiber as reinforcement and pyrolytic carbon as matrix. Because of its excellent high temperature strength, ablation resistance and good friction and wear properties, in the early 1970s, the United States carried out the research work of Chammer C composites for thermal structure, which led to the development of Cmax C composites from cauterized heat-proof materials to thermal structure materials. As a thermal structural material, C/C composite can be used in gas turbine engine components, space shuttle nose cone cap, wing leading edge and so on. Most of these parts work in high temperature and oxidation environment.
However, CPAC composites are easy to oxidize and usually cannot work normally in an oxidation atmosphere above 400℃. This requires proper anti-oxidation protection of Chammer-C composites, and the preparation of anti-oxidation coating is one of the main protective measures. The results show that when refractory metal Zr, Hf, Ta, TiB2 and other refractory metals are added to the carbon matrix, the ablation resistance of C / C composites can be further improved. In order to understand the effect of metal Hf,Ta on the ablation performance of Chand-C composites, the SiC-HfSi2-TaSi2 anti-ablation coating was prepared by embedding method, and the ablation performance of the anti-ablation coating was measured by oxyacetylene ablation device. Knot.
2. To prepare organic light-emitting devices The package cover encapsulates the light emitting layer and the cathode on the anode, and the package cover comprises a silicon carbonitride layer and a barrier layer formed on the surface of the silicon carbonitride layer. The material of the barrier layer comprises silicide and metal oxides selected from at least one of chromium silicide, tantalum disilicide, hafnium silicide, titanium disilicide, molybdenum disilicide and tungsten disilicide, and the metal oxide is selected from magnesium oxide, aluminum trioxide, titanium dioxide, zirconium oxide, hafnium dioxide and tantalum pentoxide. The lifetime of the above organic light-emitting devices is longer.
3. To prepare silicon-germanium alloy-based thermoelectric elements The silicon-germanium alloy-based thermoelectric element is composed of an electrode layer, a silicon-germanium alloy-based thermoelectric layer and a barrier layer between the electrode layer and the silicon-germanium alloy-based thermoelectric layer. The barrier layer is a mixture of silicide and silicon nitride. The silicide is at least one of molybdenum silicide, tungsten silicide, cobalt silicide, nickel silicide, niobium silicide, zirconium silicide, tantalum silicide and hafnium silicide. The interface of the silicon-germanium alloy-based thermoelectric element is well bonded, there is no crack and obvious diffusion phenomenon at the interface, the contact resistance is low, the thermal contact state is good, and can withstand high temperature accelerated test for a long time.
4. To prepare the cermet composite coating with high temperature resistance and oxidation resistance The composite film is characterized in that the coating is composed of refractory metal, refractory carbide and intermetallic compound, and the thickness of the coating is 10μm ~ 50μm. The refractory metal is one or more of molybdenum, tantalum, zirconium and hafnium; the refractory carbide is composed of silicon carbide and one or more of tantalum carbide, zirconium carbide and hafnium carbide; the intermetallic compound is one or more of molybdenum silicide, tantalum silicide, zirconium silicide, tantalum carbosilicide, zirconium carbosilicide and hafnium silicide. The crystal structure of the coating is composed of amorphous and / or polycrystalline nanoparticles.
Hafnium Silicide HfSi2 Powder Price The price is influenced by many factors including the supply and demand in the market, industry trends, economic activity, market sentiment, and unexpected events. If you are looking for the latest HfSi2 powder price, you can send us your inquiry for a quote. ([email protected])
Hafnium Silicide HfSi2 Powder Supplier Luoyang Tongrun Nano Technology Co. Ltd. (TRUNNANO) is a trusted global chemical material supplier & manufacturer with over 12-year-experience in providing super high-quality chemicals and nanomaterials including silicon powder, nitride powder, graphite powder, zinc sulfide, calcium nitride, 3D printing powder, etc. If you are looking for high-quality HfSi2 powder, please feel free to contact us and send an inquiry. ([email protected])
