About Titanium Silicide TiSi2 Powder:
With the rapid development of large integrated circuits (ULSI), the size of the equipment and equipment is getting smaller, the requirements for equipment size, film quality, and thickness uniformity are getting higher.
At present, the wire width of the semiconductor device has been reduced to less than 0.1 μm, so it is impossible to obtain a continuous conductor having a low resistance during the original process.
New materials, new processes, and new deposition systems must be found to improve or replace aluminum and heavy-doped polysilicon for circuit metallization.
In these new materials, metal silicon having high conductivity and high-temperature stability has increasing interest, compatible with the current microelectronic manufacturing process. Titanium Disilicide has low resistivity, high temperature and good stability.
In a commonly studied metal silicide (such as TiSi2, Nisi, Cosi2, WSi2, TaSi2, MOSi2), silicide (TiSi2) has ideal characteristics: high conductivity, high selectivity, good thermal stability, good Si Adsorption, good process adaptation of silicon adaptive connection parameters. Therefore, in the integrated circuit device, titanium silicide TiSi2 is widely used to produce a metal oxide semiconductor (MOS), a metal oxide semiconductor field-effect transistor (MOSFET) and a dynamic random access memory (DRAM) gate, source/leakage, mutual contact ohm.
Feel free to send an inquiry to get the latest titanium disilicide price if you would like to buy Titanium Silicide TiSi2 Powder in bulk.
Titanium Silicide TiSi2 Powder
Characteristics of Titanium Silicide TiSi2 Powder:
Titanium silicide TiSi2 powder (CAS 12039-83-7) has a high melting point, high corrosion resistance, high oxidation resistance, good electrical conductivity, high temperature ductility, a binary alloy systemthe intermediate phase.
Technical Parameter of Titanium Silicide TiSi2 Powder:
| Product Name |
MF |
Purity |
Particle Size |
Melting Point |
Density |
Color |
| titanium silicide |
TiSi2 |
99% |
5-10um |
1620℃ |
4.0 g/cm3 |
black |
Chemical Composition of Titanium Silicide TiSi2 Powder:
| TiSi2 |
Ti |
Si |
C |
P |
Fe |
S |
| ＞99% |
46.32% |
52.5% |
0.02% |
0.02% |
0.19% |
0.01% |
How is Molybdenum Silicide MoSi2 Powder produced?
Di silicide can be obtained from the reaction between titanium or hydride and silicon.
Ti + 2 Si → Tisi2
Aluminum heat can also be performed by the ignition of aluminum powder, sulfur, silica and titanium dioxide or hexafluoritititoetice, by electrolysis of hexafluoride titanate and titanium dioxide, or through tetrachloride reaction.
Another method is to react with titanium tetrachloride to silane, dichloronilane or silicon.
TiCl4 + 2 SiH4 → Tisi2 + 4 HCl + 2 H2
TiCl4 + 2 SiH2Cl2 + 2 H2 → Tisi2 + 8 HCL
TiCl4 + 3 Si → Tisi2 + SiCL4
Applications of Molybdenum Silicide MoSi2 Powder:
Titanium silicide is used in the semiconductor industry. It is typically grown by means of salicide technology over silicon and polysilicon lines to reduce the sheet resistance of local transistor connections. In the microelectronic industry, it is typically used in the C54 phase.
1. Silicide Titanide is low, the melting point is high, and the chemical properties are stable, and there is a broad use prospect in the microelectronics field.
2. Aerospace industry, ship submarine manufacturing, medical, jewelery manufacturing.
Packing & Shipping of Titanium Silicide TiSi2 Powder :
We have many different kinds of packing which depends on the titanium silicide TiSi2 powder quantity.
Titanium silicide TiSi2 powder packing: vacuum packing, 100g, 500g or 1kg/bag, 25kg/barrel, or as your request.
Titanium silicide TiSi2 powder shipping: could be shipped out by sea , by air, by express as soon as possible once payment receipt.
Luoyang Tongrun Nano Technology Co. Ltd. (TRUNNANO) is a trusted global chemical material supplier & manufacturer with over 12-year-experience in providing super high-quality chemicals and Nanomaterials, including boride powder, nitride powder, graphite powder, sulfide powder, 3D printing powder, etc.
If you are looking for high-quality TiSi2 powder, please feel free to contact us and send an inquiry. ([email protected])
FAQs
What is titanium silicide?
Titanium silicide (TiSi₂) is a compound formed by the reaction of titanium and silicon, commonly used in semiconductor manufacturing to reduce the contact resistance between metal contacts and silicon substrates, enhancing device performance and reliability.
What is titanium silicate?
Titanium silicate refers to a group of compounds containing both titanium and silicate ions. These materials find applications in catalysis, adsorbents, and as components in certain types of ceramics due to their thermal stability and chemical properties.
What is tantalum silicide used for?
Tantalum silicide (TaSi₂) is utilized in microelectronics, primarily as a diffusion barrier and contact material in integrated circuits. It prevents the unwanted diffusion of elements and reduces electrical resistance, improving the efficiency and longevity of electronic devices.
What is the hardness of titanium silicides?
The hardness of titanium silicides, such as TiSi₂, typically ranges from 7 to 8 on the Mohs scale, making it harder than pure titanium but softer than many ceramics. This hardness contributes to its durability and suitability for use in high-wear applications.
Titanium silicide formation temperature?
Titanium silicide (TiSi₂) formation usually occurs at temperatures above 600°C (1112°F), with the exact temperature depending on the process and environment. The reaction is part of the semiconductor fabrication process, where controlled heating facilitates the silicidation.
