About Cobalt Silicide CoSi2 Powder:
Cobalt Silicide is an intermetallic compound, a silicate of cobalt. It is a superconductor with a Ca transition temperature. Cobalt disilicide, chemical formula CoSi2.Molecular weight 115.11.Dark brown rhombic crystal.Melting point 1277℃, relative density 5.3. It can be oxidized at 1200℃ to erode its surface; Reacts with fluorine at low temperatures, and with chlorine at 300 ° C. Attack by hydrogen fluoride, dilute, concentrated nitric acid and sulfuric acid, also can be violently attacked by molten strong alkali. It acts slowly with boiling concentrated hydrochloric acid.
CoSi2 powder has low resistivity, good thermal stability, and is widely used as a contact in large-scale integrated circuits. And CoSi2 has a similar crystal structure to Si, so it can form an epitaxial CoSi2/Si structure on Si substrate, which is used to study the interface characteristics of epitaxial silicon metal.
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Characteristics of Cobalt Silicide CoSi2 Powder:
Cobalt silicide CoSi2 powder (CAS 12017-12-8) has a high melting point, high corrosion resistance, high oxidation resistance, good electrical conductivity, high-temperature ductility, a binary alloy systemthe intermediate phase.
Technical Parameter of Cobalt Silicide CoSi2 Powder:
| Product Name |
MF |
Purity |
Particle Size |
Melting Point |
Density |
Color |
| cobalt silicide |
CoSi2 |
99% |
5-10um |
1277℃ |
5.3 g/cm3 |
black |
How is Cobalt Silicide CoSi2 Powder produced?
In general, the manufacturing method of cobalt disilicide is to first form metal cobalt (CO) layer on a silicon substrate and then after two annealing treatments to convert cobalt to Cobalt disilicide. The first annealing process involves the diffusion of shillings of cobalt into a siliceous substrate to form a layer of cobalt silicate (COSi). The second annealing process is to convert the cobalt silicate layer into Cobalt disilicide with a low resistance to reduce the resistance of the component.
Application of Cobalt Silicide CoSi2 Powder:
Cobalt Silicide CoSi2 Powder is used in optoelectronic devices, electronic devices, energy devices, lasers, semiconductors, etc.
Silicide nanostructures have potential important applications in a series of fields of nanoelectronics: semiconductor silicide nanostructures (FeSi2) can be used to prepare nano-electronic active devices, which may have very important applications in silicon-based nano-luminescent devices; Metallic silicides (CoSi2, NiSi2) can be used as nanowires in future quantum computers and fault-tolerant terahertz nanocircuit computers. Since epitaxial silicide conductors can be prepared on silicon substrates, their performance will be greatly improved compared with ordinary metal nanowires because of the absence of grain boundaries.Au nanostructures can also be used in molecular electronics as a single molecule or nanoelectrode of several molecules. In the process of semiconductor components, low resistance Cobalt disilicide (CoSi2) layers are formed at internal electrical connection points such as gate, source, or drain.
Packing & Shipping of Cobalt Silicide CoSi2 Powder:
We have many different kinds of packing which depend on the cobalt silicide CoSi2 powder quantity.
Cobalt silicide CoSi2 powder packing: vacuum packing, 1kg/bag, 25kg/barrel, or as your request.
Cobalt silicide CoSi2 powder shipping: could be shipped out by sea, by air, by express as soon as possible once payment receipt.
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