Silicon Nitride Si3N4 Powder CAS 12033-89-5

About Silicon Nitride Si3N4 Powder:

The silicon nitride composition is silicon and nitrogen. Si3n4 is the most thermodynamic stable in silicon nitride. It is a white solid with a high melting point, relative chemical inert, diluted HF, and hot H2SO4 attack. It is hard (8.5 on the Mohs scale) and has high thermal stability.

Silicon nitride is an inorganic substance, and the silicon nitride formula is Si3N4. It is an important structural ceramic material with high hardness and lubricity, wear resistance, an atomic crystal, and antioxidation at high temperatures.

Silicon nitride thermal conductivity is 17.44 ~ 23.26W/(m·℃) (0 ~ 1000℃). Moreover, it can resist the impact of cold and cold, heated into the air to 1000 ° C or more, and the sharp cooling and heating will not be broken. It is precise because silicon nitride ceramic has such excellent properties, and people often utilize them to make mechanical components such as bearings, air turbine blades, mechanical seals, and permanent molds. Suppose silicon nitride ceramic si3n4 is resistant to high temperatures and is not easily transferred. In that case, the heat-inspiration surface of the engine member can be improved, not only in the quality but also in saving fuel and improving thermal efficiency. 

Silicon nitride is difficult to produce as a bulk material—it cannot be heated over 1850 °C, which is well below its melting point, due to dissociation to silicon and nitrogen. Therefore, the application of conventional hot press sintering techniques is problematic. Bonding of silicon nitride powders can be achieved at lower temperatures by adding additional materials (sintering aids or "binders"), which commonly induce a degree of liquid phase sintering. A cleaner alternative is spark plasma sintering, where heating is conducted rapidly (seconds) by passing pulses of electric current through the compacted powder. Dense silicon nitride compacts have been obtained by this technique at temperatures 1500–1700 °C. 

TRUNNANO is a trusted global silicon nitride manufacturer and silicon nitride supplier. Feel free to inquire about the latest silicon nitride price if you would like to buy silicon nitride si3n4 powder in bulk.

Product Characteristics of Silicon Nitride Si3N4 Powder:

Low density

High-temperature strength

Superior thermal shock resistance

Excellent wear resistance

Good fracture toughness

Mechanical fatigue and creep resistance

Good oxidation resistance

Characteristics of Silicon Nitride

High melting point: Silicon nitride has a melting point of up to 3,000°C, which makes it show good stability in high-temperature environments. Silicon nitride has an excellent performance in manufacturing high-temperature ceramics, refractory materials, high-temperature bearings, aircraft engines, and other key areas.

High hardness: Silicon nitride is second only to diamond in hardness and has excellent wear resistance. This makes it widely used to manufacture high-performance ceramic products such as cutting tools, drills, and wear parts.

High strength: Silicon nitride has high flexural strength and fracture toughness, which allows it to remain stable when subjected to high loads. Therefore, it has broad application prospects in manufacturing high-strength, high-wear-resistant structural materials.

Oxidation resistance: At high temperatures, silicon nitride effectively resists oxidation, which allows it to remain stable in high-temperature environments. Therefore, it has many applications in high-temperature environments in aerospace, automotive, electric power, and other fields.

Good chemical stability: Silicon nitride does not react with acids and bases at room temperature and only reacts with fluorine and hydrofluoric acid at high temperatures exceeding 1800°C. This makes it stable in many chemical processes. There will be broader application prospects.

Specification of Silicon Nitride Si3N4 Powder:
Product Name: Silicon Nitride
Purity: 99%
Particle Size: 0.5um-1um (α phase)

How is Silicon Nitride Si3N4 Powder produced?

The hexagonal β-Si3N4 can directly carry out silicon nitride, and nitrogen can be carried out a 100-1400 ° C.

SiCL4 (L) + 6 NH3 (g) → Si (NH) 2 (S) + 4 NH4Cl (S) under conditions of 0 ° C

3 Si (NH) 2 (S) → Si3N4 (S) + N2 (g) + 3 H2 (g) under the conditions of 1000 ° C

Or use a carbon thermal reduction reaction in a nitrogen atmosphere of 1400-1450 ° C under a nitrogen atmosphere:

3 SiO2 (S) + 6 C (S) + 2 N2 (g) → Si3N4 (S) + 6 CO (g)

However, the purity of the raw silicon materials will cause silicon nitride to be produced containing impurity silicate and iron. The silicon nitride synthesized by diamine decomposing is an amorphous shape. It is necessary to do an annealing treatment in nitrogen at 1400-1500 ° C to convert it into crystalline powder, and diamine decomposition is only important. Commercially in nitriding method to produce silicon nitride. The carbon-thermal reduction reaction is the simplest way to produce silicon nitride and the most cost-effective means of manufacturing silicon powder in the industry.

The electron-level silicon nitride film is made by chemical vapor deposition or plasma-enhanced chemical vapor deposition techniques:

3 SiH4 (G) + 4 NH3 (g) → Si3N4 (S) + 12 H2 (g)

3 SiCL4 (G) + 4 NH3 (g) → Si3N4 (S) + 12 HCl (g)

3 SiCL2H2 (G) + 4 NH3 (g) → Si3N4 (S) + 6 HCl (g) + 6 H2 (g)

If you want to deposit silicon nitride on the semiconductor substrate, there are two methods available for use:

The vertical or horizontal tube furnace is performed at a relatively high temperature using low-pressure chemical vapor deposition techniques.

Plasma-enhanced chemical vapor deposition techniques are carried out at a relatively low temperature in vacuum conditions.

The cell parameters of silicon nitride are different from single-textile silicon. Therefore, depending on the deposition method, the generated silicon nitride film will generate tension or stress. In particular, when using plasma-enhanced chemical vapor deposition techniques, tension can be reduced by adjusting deposition parameters.

The silica was prepared by soluble gel, and then the silicon nanowires were treated with silica gel, in which the carbon-thermal reduction method and nitride were treated. The special carbon particles in silica gel are produced by glucose at 1200-1350 ° C.

Applications of Silicon Nitride Si3N4 Powder:

Manufacturing structure: such as metallurgy, machinery, aviation, and aerospace.

Surface treatment of metals and other materials, such as molds, cutting tools, and turbine blades.

Composites: such as metal, ceramic and graphite composite, rubber, plastic

Colorless, transparent, self-lubricating wear nanoparticle membrane for mobile phones;

Advanced surface protection, such as a car;

Jack's joint;

Ball valve and part;

Corrosion-resistant turbine;

Metallurgical, aviation, chemical, energy and machinery industries make parts such as bead/roller bearings, sleeves, valves, and other wear;

Making cutting tools, molds, cylindrical wall coating, turbine rotors and blades;

Manufacturing composite materials such as ceramic, graphite, rubber, metal, adhesive, etc.

Nozzle, rocket, and missile spray pipe.

Packing & Shipping of Silicon Nitride Si3N4 Powder :

We have many different kinds of packing, which depend on the silicon nitride Si3N4 powder quantity.

Silicon nitride Si3N4 powder packing: vacuum packing, 100g, 500g, or 1kg/bag, 25kg/barrel, or as you request.

Silicon nitride Si3N4 powder shipping: could be shipped out by sea, by air, or by express as soon as possible once payment receipt.

Silicon nitride Si3N4 powder supplier

Luoyang Tongrun Nano Technology Co. Ltd. (TRUNNANO) is a trusted global chemical material supplier & manufacturer with over 12 years of experience in providing super high-quality chemicals and Nanomaterials, including boride powder, nitride powder, graphite powder, sulfide powder, 3D printing powder, etc.

If you are looking for high-quality silicon nitride Si3N4 powder, please feel free to contact us and send an inquiry. ([email protected])