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Tantalum disilicide Uses

Views : 15
Author : trunnano
Update time : 2022-08-02 16:25:26
What is Tantalum silicide?
Tantalum disilicide chemical formula is TaSi2. It has excellent properties such as high melting point, low resistivity, corrosion resistance, high temperature oxidation resistance, and good compatibility with silicon, carbon and other matrix materials.

Tantalum disilicide Uses
Tantalum disilicide is mainly used in electric heating elements, high temperature structural components, gate materials, connection circuits of integrated circuits, high temperature oxidation resistance coatings, cermets, ceramic matrix composites, aerospace, engines, and other fields.

Metal silicide
Tantalum disilicide is a kind of refractory metal silicide.
Metal silicide refers to the hard compound formed by transition metal and silicon. Due to the large radius of silicon atoms, it cannot form interstitial compounds with transition metals, so these hard compounds have stable chemical composition and good oxidation resistance.
Metal silicide has similar electrical conductivity, high temperature performance, oxidation resistance and compatibility with silicon integrated circuit production process. Transition metal silicide can be used for low resistance gate and internal wiring, resistance contact.

Tantalum silicide Production
The preparation methods of tantalum silicide include combustion synthesis (CS) or self-propagating high temperature synthesis (SHS), and arc melting.
Combustion synthesis or self-propagating high temperature synthesis is a method for the synthesis of intermetallic compounds by the exothermic reaction of elements / compounds. It has the advantages of simple equipment, low energy consumption and short synthesis time. Its main disadvantages are fast reaction speed, difficult process control and easy existence of miscellaneous phases.
The combustion synthesis of tantalum silicide needs preheating to initiate the reaction to realize the synthesis, but there is a phase other than disilicide.
Arc melting generally takes a long time to homogenize, and the loss of silicon caused by volatilization in the melting process may lead to the formation of some impurity phases. Because of its jet temperature up to 10000 ℃ and jet speed up to 300-400m/s, plasma spraying technology has the advantages of high temperature melting, rapid solidification and near-net forming, and it is not limited by shape or size, so it is easy to realize its short process forming, so it has gradually developed into a new type of parts forming technology, which has been used to prepare some parts. Tantalum silicide powder is made into bulk material by plasma spraying technology, which requires high purity tantalum silicide powder as raw material. Therefore, how to obtain high purity tantalum silicide powder (without impurity phase formation) becomes the key.

Tantalum silicide Price
The price is influenced by many factors including the supply and demand in the market, industry trends, economic activity, market sentiment, and unexpected events.
If you are looking for the latest TaSi2 powder price, you can send us your inquiry for a quote. ([email protected])

Tantalum silicide Supplier
Luoyang Tongrun Nano Technology Co. Ltd. (TRUNNANO) is a trusted tantalum silicide manufacturer and tantalum silicide supplier with over 12-year-experience. We ship our goods all over the world.
If you are looking for high-quality TaSi2 powder, please feel free to contact us and send an inquiry. ([email protected])

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