Indium tin oxide ITO is a transparent brown or yellowish gray mixture. It usually consists of 90% indium oxide (In2O3) and 10% tin oxide (SnO2). Indium tin oxide has excellent electrical conductivity and optical transparency. physical vapor deposition and sputtering deposition are usually used to form thin films with high visible luminosity and low resistance. it is widely used in electronics, photovoltaic, glass, chemical, military and other fields.
 
What is ITO Indium tin oxide used for?
The electronics and photovoltaic industry are the main application market of indium tin oxide. In the electronics industry, indium tin oxide can be used in the manufacture of light-emitting diodes, touch screens, electronic paper, liquid crystal displays, electromagnetic interference shielding films, antistatic coatings, etc., as well as in mobile phones, computers, televisions, smart devices and other fields; in the photovoltaic industry, indium tin oxide can be used in the manufacture of optical films and solar cells. In addition, because indium tin oxide can be used at high temperature, it can also be used in the fields of military industry, aerospace and engine manufacturing.
 
With the rapid development of the electronics industry, the popularity of touch screens in smart phones, tablet computers, wearable devices, automotive electronics, service robots and other fields is increasing. The realization of touch screen needs materials with good transparency and conductivity to assist. After continuous exploration, indium tin oxide with excellent performance stands out and becomes the mainstream material. Indium tin oxide has excellent nonlinear optical properties, which is much higher than a variety of materials that can be commercially applied at the present stage. The study of nonlinear optics is of great significance to the development of laser technology and spectroscopy. Indium tin oxide also has great potential in the field of photonics applications in the future.
 
ITO target
ITO target is a kind of precious metal material, which is one of the ceramic targets in sputtering targets. The middle and low end ITO targets include glass coating target, heating film and thermal reflection film target, including the display screen of automobile and the display of some instruments. High-end ITO targets are mainly used for display film targets, integrated circuit film targets, magnetic recording and optical recording film targets.
 
Fabrication method of ITO sputtering target.
Vacuum hot pressing.
Vacuum hot pressing uses thermal and mechanical energy to densify ITO powder to produce high-density ITO ceramic targets with a density of 91% to 96%. ITO targets with close to expected density and porosity close to zero can be easily obtained by this method. However, due to the limitation of equipment and mold size, vacuum hot pressing has little advantage in preparing large size sputtering targets.
 
Hot isostatic pressing.
Hot isostatic pressing (HIP) is used to prepare ITO sputtering targets by sintering under pressure or pressing at high temperature. Similar to vacuum hot pressing, HIP can obtain products with high density (almost theoretical density) and excellent physical and mechanical properties under heating and pressure. But it is also limited by equipment pressure and cylinder size.
 
Room temperature sintering.
At room temperature, the high density target preform is prepared by slurry pouring or prepressing, and then the ITO target is obtained by sintering in a certain atmosphere and temperature. Its biggest advantage is that it can produce large-size sputtering targets. However, compared with other sintering methods, the purity of the target made by this method is lower.
 
Cold isostatic pressing.
Cold isostatic pressing (CIP) uses rubber or plastic as coating material and liquid as pressure medium to transfer ultra-high pressure at room temperature. CIP can also prepare larger size ITO sputtering targets. And the price is cheap, suitable for mass production. However, CIP requires the material to be sintered at 1500 ~ 1600 °C in a pure oxygen environment of 0.1 ~ 0.9 MPa, which has high risk.
 
ITO target / ITO film / ITO conductive glass
These three words are interrelated. In short, ITO conductive glass is made by sputtering or evaporating a layer of ITO film on an ultra-thin glass. Here, the ITO target is the source of indium tin oxide atoms; when these indium tin oxide atoms are deposited on the substrate (glass), ITO films are obtained, and the glass coated with ITO films is called ITO conductive glass.
 
What is ITO sputtering target used for?
ITO sputtering targets and their derivatives such as ITO thin films and ITO glass are widely used in various industries. ITO targets are often used to make transparent and conductive coatings for liquid crystal displays (LCD), flat panel displays, plasma displays and touch panels. ITO thin films are used for organic light-emitting diodes, solar cells and antistatic coatings. In addition to the electronics industry, ITO targets are also used for a variety of optical coatings, most famous for infrared reflection coatings and automotive sodium vapor lamp glass.
 
ITO Indium tin oxide Price
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ITO Indium tin oxide Supplier
Luoyang Tongrun Nano Technology Co. Ltd. (TRUNNANO) is a trusted ITO Indium tin oxide manufacturer and ITO supplier with over 12-year-experience. We ship our goods all over the world.
 
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