By LZH | 03 August 2023 | 0 Comments
Exposure of Tantalum Carbide to Chlorine Trifluoride Gas
What is Tantalum Carbide?
Tantalum carbide (TaC), an ultra-high temperature ceramic (UHTC), is well known for its exceptional properties such as high hardness (15-19 GPa), melting point (3950 °C), elastic modulus (537 GPa), chemical resistance, and thermal shock resistance. To make TaC the future material for hypersonic vehicles, it is required to improve its thermal conductivity, strength, and fracture toughness. Researchers have previously reinforced TaC ceramic with carbides of silicon and boron and carbon nanotubes (CNTs); however, these reinforcements either undergo chemical changes or induce defects in the matrix during processing. In addition, these reinforcements exhibit a very minimal improvement in the properties. In the present work, we attempted to improve TaC fracture toughness by reinforcing with graphene nano-platelets (GNPs) and processing through spark plasma sintering at a high temperature of 2000 °C, pressure of 70 MPa, and soaking time of 10 min. In addition, we investigated the active densification mechanism during the SPS of TaC powder and the effect of ball milling time on the mechanical properties of sintered TaC.
Spark plasma sintering of tantalum carbide and graphene reinforced tantalum carbide composites
A relative density of >96% was achieved using SPS of monolithic TaC (<3 μm). Ball milling improved the sintering kinetics and mechanical properties (microhardness, bi-axial flexural strength, and indentation fracture toughness). The activation energy (100 kJ/mol) and stress exponent (1.2) were obtained using the analytical model developed for power-law creep. Based on these calculations, grain boundary sliding is proposed as an active densification mechanism. Reinforcing GNPs (2-6 vol.% ) in the TaC matrix improved relative density (99.8% for TaC-6 vol.% GNP). Also, ∼a 150% and ∼180% increase in flexural strength and fracture toughness were observed for TaC-6 vol.% GNP composite. The significant improvement in these properties is attributed to improved densification and toughening mechanisms, such as sheet pull-out and crack deflection, due to the reinforcement of graphene. Uniform dispersion of GNPs in the TaC matrix is observed from microstructural analysis. Raman spectroscopy analysis also indicated that GNPs are successfully retained in sintered TaC-GNP composites without damage.
Exposure of Tantalum Carbide to Chlorine Trifluoride Gas
Widely used coating materials, such as tantalum carbide, were exposed to chlorine trifluoride gas at various temperatures. The tantalum carbide powder was etched and vaporized by a quick and significant exothermic chemical reaction at temperatures higher than room temperature. The silicon nitride powder was etched, which produced volatile products at temperatures higher than 250°C. An aluminum nitride plate and powder showed a slight increase in weight at temperatures higher than 500°C due to fluorination. The aluminum nitride plate thickness increased, causing a surface smoothing effect without cracking. The aluminum nitride is expected to work as the anticorrosive coating material to the chlorine fluoride gas at high temperatures, thus allowing fluorination. Manufacturing processes of semiconductor materials and devices utilize various chemical reactions caused by various reactive compounds, such as hydrides, halides, and organic metals, at various temperatures and pressures. The highly corrosive gases not only perform the targeted processes, such as etching but also frequently and simultaneously corrode and deteriorate the surface of co-existing materials, such as carbon and quartz. The weak material surfaces are covered with robust coating films made of tantalum carbide, silicon nitride, aluminum nitride, and yttrium oxide.
Price of Tantalum Carbide
Tantalum Carbide particle size and purity will affect the product's Price, and the purchase volume can also affect the cost of Tantalum Carbide. A large amount of large amount will be lower. The Price of Tantalum Carbide is on our company's official website.
Tantalum Carbide supplier
Luoyang Tongrun Nano Technology Co. Ltd. (TRUNNANO) Luoyang City, Henan Province, China, is a reliable and high-quality global chemical material supplier and manufacturer. It has more than 12 years of experience providing ultra-high quality chemicals and nanotechnology materials, including Tantalum Carbide, nitride powder, graphite powder, sulfide powder, and 3D printing powder. If you are looking for high-quality and cost-effective Tantalum Carbide, you are welcome to contact us or inquire at any time.
Tantalum carbide (TaC), an ultra-high temperature ceramic (UHTC), is well known for its exceptional properties such as high hardness (15-19 GPa), melting point (3950 °C), elastic modulus (537 GPa), chemical resistance, and thermal shock resistance. To make TaC the future material for hypersonic vehicles, it is required to improve its thermal conductivity, strength, and fracture toughness. Researchers have previously reinforced TaC ceramic with carbides of silicon and boron and carbon nanotubes (CNTs); however, these reinforcements either undergo chemical changes or induce defects in the matrix during processing. In addition, these reinforcements exhibit a very minimal improvement in the properties. In the present work, we attempted to improve TaC fracture toughness by reinforcing with graphene nano-platelets (GNPs) and processing through spark plasma sintering at a high temperature of 2000 °C, pressure of 70 MPa, and soaking time of 10 min. In addition, we investigated the active densification mechanism during the SPS of TaC powder and the effect of ball milling time on the mechanical properties of sintered TaC.
Spark plasma sintering of tantalum carbide and graphene reinforced tantalum carbide composites
A relative density of >96% was achieved using SPS of monolithic TaC (<3 μm). Ball milling improved the sintering kinetics and mechanical properties (microhardness, bi-axial flexural strength, and indentation fracture toughness). The activation energy (100 kJ/mol) and stress exponent (1.2) were obtained using the analytical model developed for power-law creep. Based on these calculations, grain boundary sliding is proposed as an active densification mechanism. Reinforcing GNPs (2-6 vol.% ) in the TaC matrix improved relative density (99.8% for TaC-6 vol.% GNP). Also, ∼a 150% and ∼180% increase in flexural strength and fracture toughness were observed for TaC-6 vol.% GNP composite. The significant improvement in these properties is attributed to improved densification and toughening mechanisms, such as sheet pull-out and crack deflection, due to the reinforcement of graphene. Uniform dispersion of GNPs in the TaC matrix is observed from microstructural analysis. Raman spectroscopy analysis also indicated that GNPs are successfully retained in sintered TaC-GNP composites without damage.
Exposure of Tantalum Carbide to Chlorine Trifluoride Gas
Widely used coating materials, such as tantalum carbide, were exposed to chlorine trifluoride gas at various temperatures. The tantalum carbide powder was etched and vaporized by a quick and significant exothermic chemical reaction at temperatures higher than room temperature. The silicon nitride powder was etched, which produced volatile products at temperatures higher than 250°C. An aluminum nitride plate and powder showed a slight increase in weight at temperatures higher than 500°C due to fluorination. The aluminum nitride plate thickness increased, causing a surface smoothing effect without cracking. The aluminum nitride is expected to work as the anticorrosive coating material to the chlorine fluoride gas at high temperatures, thus allowing fluorination. Manufacturing processes of semiconductor materials and devices utilize various chemical reactions caused by various reactive compounds, such as hydrides, halides, and organic metals, at various temperatures and pressures. The highly corrosive gases not only perform the targeted processes, such as etching but also frequently and simultaneously corrode and deteriorate the surface of co-existing materials, such as carbon and quartz. The weak material surfaces are covered with robust coating films made of tantalum carbide, silicon nitride, aluminum nitride, and yttrium oxide.
Price of Tantalum Carbide
Tantalum Carbide particle size and purity will affect the product's Price, and the purchase volume can also affect the cost of Tantalum Carbide. A large amount of large amount will be lower. The Price of Tantalum Carbide is on our company's official website.
Tantalum Carbide supplier
Luoyang Tongrun Nano Technology Co. Ltd. (TRUNNANO) Luoyang City, Henan Province, China, is a reliable and high-quality global chemical material supplier and manufacturer. It has more than 12 years of experience providing ultra-high quality chemicals and nanotechnology materials, including Tantalum Carbide, nitride powder, graphite powder, sulfide powder, and 3D printing powder. If you are looking for high-quality and cost-effective Tantalum Carbide, you are welcome to contact us or inquire at any time.
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